PRESENTATION

LN-based PICs: Novel techniques for structuring and yield improvements with ion beam etching

Lithium niobate (LN)-based photonic integrated circuits will play a major role in many future applications. Current structuring techniques using plasma-based etching tools face significant challenges in achieving high-quality waveguides. Ion beam etching delivers high-quality structures with low optical loss, thanks to low roughness and strongly reduced fencing. The ion beam etching technology also enables new options for designers, such as variable sidewall angles. scia Systems will demonstrate novel structuring techniques with the scia Mill 200 system and yield-improving techniques with the scia Trim 200 system.