PRESENTATION

Structuring and Uniformity Improvement of Thin Film LN and other Waveguide Materials

Demand for PICs is growing rapidly in telecommunications and data centers due to their wide bandwidth, low transmission loss, and numerous other advantages over traditional electronic integrated circuits. Thin film waveguides, widely acclaimed for their electro-optic and piezoelectric properties, demand precise fabrication techniques to ensure consistent device performance. Integrating new materials, material stacks, and designs is pivotal in advancing photonics and optoelectronics, but it requires new etching solutions. scia Systems’ advanced ion beam etching and trimming processes enable the manufacturing of three-dimensional optoelectronic microstructures for PICs.

Philipp Böttger

scia Systems GmbH

After completing his physics degree at Chemnitz University of Technology in 2012, Philipp Böttger became a research assistant at Fraunhofer ENAS. His main field of work was the development of AC-powered LEDs based on quantum dots. In 2015, he moved to the research and development department at scia System, focusing on process development for ion beam trimming systems. He then moved to the technical sales department of the same company. He is mainly responsible for sales projects in Germany, Benelux, and North America.