Manufacturing novel optical sensors for data centers, telecom networks, high-speed computing for artificial intelligence, or LiDAR components for next-generation autonomous driving requires a reliable, robust, and flexible manufacturing technology. One key solution for efficient production of novel photonic devices is Nanoimprint Lithography. It enables the structuring of an entire wafer in a single process step. Moreover, SmartNIL® technology allows for aligned imprinting on functional surfaces as well as partial imprinting in combination with inkjet coating. The optical structures are fully functional directly after imprinting and can range from sub-μm up to several microns in height. We will present the entire process flow for wafer structing with the main characteristics of the technology, including recent applications.
Thomas Achleitner is a Business Development Manager at EV Group, concentrating on Micro and Nanoimprinting for diverse applications, such as nanophotonic elements and wafer level optics. Thomas holds a degree in Innovation and Product Management from University of Applied Sciences Upper Austria. He has accrued several years of experience as a Senior Process Engineer in Nano Imprinting Lithography, specifically focusing on diffractive optical elements for Augmented Reality and Virtual Reality devices.